Product Overview

Hydrogen peroxide (H2O2) is a powerful oxidizing agent with remarkable chemical versatility, characterized by its simple molecular structure of two hydrogen and two oxygen atoms. This 5% ACS Grade solution represents a precisely formulated chemical reagent designed for rigorous scientific and industrial applications. The carefully controlled concentration ensures optimal reactivity while maintaining exceptional stability for demanding analytical and research requirements.

Historically discovered in 1818 by Louis Jacques Thénard, hydrogen peroxide has evolved from a laboratory curiosity to a critical industrial chemical. Its unique oxidative properties make it an essential compound in numerous technical processes, offering powerful electron transfer capabilities that enable complex chemical transformations across multiple scientific disciplines.

Key Properties

• Chemical Formula: H2O2
• CAS Number: 7722-84-1
• Boiling Point: 150.2°C
• Melting Point: -0.4°C
• Specific Gravity: 1.02
• Flash Point: 93°C
• Molecular Weight: 34.01 g/mol
• Appearance: Clear colorless liquid
• Solubility: Highly water soluble
• Chemical Stability: Moderate decomposition potential

Common Applications

• Chemical Synthesis: Researchers utilize hydrogen peroxide as a critical oxidizing agent in organic synthesis, enabling precise controlled oxidation reactions that transform substrate molecules through electron transfer mechanisms and oxygen introduction.
• Industrial Bleaching: Manufacturing processes leverage hydrogen peroxide's oxidative properties for textile and paper bleaching, providing an environmentally friendly alternative to chlorine-based bleaching agents with superior ecological compatibility.
• Environmental Analysis: Analytical laboratories employ this reagent for precise water quality testing, utilizing its reactive properties to detect and quantify complex environmental contaminants through advanced spectroscopic techniques.
• Materials Processing: Scientific research and industrial applications utilize hydrogen peroxide for surface treatment and material activation, enabling precise molecular-level modifications of substrates in semiconductor and advanced materials development.
• Chemical Etching: Precision manufacturing processes use controlled hydrogen peroxide concentrations for microscale etching of silicon, metals, and semiconductor materials, enabling sophisticated microfabrication techniques.

Safety Precautions

Hydrogen peroxide requires careful handling using appropriate personal protective equipment, including chemical-resistant gloves, splash-resistant safety goggles, and a laboratory coat. Always work in a well-ventilated area with immediate access to eyewash and safety shower stations to mitigate potential exposure risks.

Store this chemical in tightly sealed, opaque containers made of compatible materials such as high-density polyethylene. Maintain storage temperatures between 4-25°C, protecting the solution from direct sunlight and heat sources to prevent decomposition and maintain chemical stability.

Exercise extreme caution during handling, as hydrogen peroxide can cause skin and eye irritation. In case of accidental contact, immediately flush affected areas with copious amounts of water for at least 15 minutes. Seek medical attention if irritation persists or significant exposure occurs.

Benefits

This ACS Grade hydrogen peroxide offers unparalleled purity and consistency, meeting the most stringent analytical standards. Its precisely controlled 5% concentration provides optimal reactivity for sophisticated research and industrial applications, ensuring reproducible results across complex scientific investigations.

By selecting this high-quality chemical, researchers and industrial professionals gain access to a versatile oxidizing agent with exceptional performance characteristics. The product's rigorous quality control guarantees minimal impurities, enabling sophisticated analytical techniques and advanced chemical transformations with unprecedented reliability.